A research team composed of scientists in Japan and the UK has discovered a chemical compound that could be used to produce non-toxic infrared (IR) semiconductors. It would also be cheaper than the compounds currently used to produce such semiconductors. The compound is composed of calcium, oxygen and silicon and its formula is Ca3SiO. It has been shown to be a ‘direct transition semiconductor’, which means it is capable of emitting IR radiation. Current non-toxic semiconductors are not capable of emitting IR radiation.
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